Mask alignment system with UV Nanoimprint capability featuring EVG´s proprietary SmartNIL® technology up to 150 mm
Known for its automation flexibility and reliability, this system provides state-of-the-art mask alignment technology on a minimized footprint. Operator-friendly software, minimized time for mask and tooling changes, as well as efficient worldwide service and support makes it the ideal solution for any R&D environment up to semi-automated volume production. The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode. Furthermore, the EVG’s proprietary SmartNIL technology is supported.
SmartNIL is the industry-leading NIL technology, enabling the patterning of extremely small features down to less than 40 nm*, as well as a wide range of structure sizes and shapes. SmartNIL in combination with multi-use soft-stamp technology enables unmatched throughput with considerable cost-of-ownership advantages while preserving scalability and maintenance-friendly operation. EVG’s SmartNIL redeems the long-term promise of nanoimprinting being a low-cost and high-volume alternative lithography technology for mass manufacturing of micro- and nanoscale structures.
*resolution dependent on process and template
Features
- Top-side and bottom-side alignment capability
- High-precision alignment stage
- Automated wedge compensation sequence
- Motorized and recipe controlled exposure gap
- Supports the latest UV-LED technology
- Minimized system footprint and facility requirements
- Step-by-step process guidance
- Remote tech support
- Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
- Agile processing and conversion re-tooling
- Table top or stand-alone version with anti-vibration granite table
- Additional capabilities:
- Bond alignment
- IR alignment
- Smart NIL®
- µ-contact printing
Technical Data
| Wafer diameter (substrate size) |
|---|
| Standard lithography: 75 up to 200 mm |
| Soft UV-NIL: 75 up to 200 mm |
| SmartNIL®: up to 150 mm |
| Resolution |
|---|
| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
|---|
| Soft UV-NIL & SmartNIL® |
| Exposure source |
|---|
| Mercury light source or UV LED light source |
| Alignment |
|---|
| Soft-NIL: ≤ ± 0.5 µm |
| SmartNIL®: ≤ ± 3 µm |
| Automated separation |
|---|
| Soft UV NIL: not supported |
| SmartNIL®: supported |
| Working stamp fabrication |
|---|
| Soft UV-NIL: external |
| SmartNIL®: supported |
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