Mask alignment system with UV Nanoimprint Lithography capability featuring EVG´s proprietary SmartNIL® technology up to 100 mm
Known for its flexibility and reliability, the EVG620 NT provides state-of-the-art mask alignment technology on a minimized footprint. Operator-friendly software, minimized time for mask and tooling changes, as well as efficient worldwide service support makes them the ideal solution for any R&D environment up to semi-automated volume production. The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode. Furthermore, the EVG’s proprietary SmartNIL technology is supported.
SmartNIL is the industry leading NIL technology, enabling the patterning of extremely small features down to less than 40 nm*, as well as a wide range of structure sizes and shapes. SmartNIL in combination with multi-use soft-stamp technology enables unmatched throughput with considerable cost-of-ownership advantages while preserving scalability and maintenance-friendly operation. EVG’s SmartNIL redeems the long-term promise of nanoimprinting being a low-cost and high-volume alternative lithography technology for mass manufacturing of micro- and nanoscale structures.
*resolution dependent on process and template
Features
- Top-side and bottom-side alignment capability
- High-precision alignment stage
- Automated wedge compensation sequence
- Motorized and recipe controlled exposure gap
- Supports the latest UV-LED technology
- Minimized system footprint and facility requirements
- Step-by-step process guidance
- Remote tech support
- Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
- Agile processing and conversion re-tooling
- Table top or stand-alone version with anti-vibration granite table
- Additional capabilities:
- Bond alignment
- IR alignment
- SmartNIL
- µ-contact printing
Technical Data
| Wafer diameter (substrate size) |
|---|
| Standard lithography: pieces up to 150 mm |
| Soft UV-NIL: pieces up to 150 mm |
| SmartNIL®: up to 100 mm |
| Resolution |
|---|
| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
|---|
| Soft UV-NIL & SmartNIL® |
| Exposure source |
|---|
| Mercury light source or UV LED light source |
| Alignment |
|---|
| Soft-NIL: ≤ ± 0.5 µm |
| SmartNIL®: ≤ ± 3 µm |
| Automated separation |
|---|
| Soft UV NIL: not supported |
| SmartNIL®: supported |
| Working stamp fabrication |
|---|
| Soft UV-NIL: external |
| SmartNIL®: supported |
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